METHOD FOR MEASURING THE DISTANCE BETWEEN TWO OBJECTS

In order to make possible a reliable distance measurement in a method for optically measuring the distance between a substantially scattering object and a substantially specularly reflective object by means of a light line using at least one light source and at least one light receiver, even under d...

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Bibliographische Detailangaben
1. Verfasser:	KUBITZEK, RÜDIGER
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS METALLURGY PHYSICS PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH TESTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	In order to make possible a reliable distance measurement in a method for optically measuring the distance between a substantially scattering object and a substantially specularly reflective object by means of a light line using at least one light source and at least one light receiver, even under difficult geometrical and lighting conditions, the light line includes both at least one region of the scattering object and at least one region of the specularly reflective object and both the light of the light line that is scattered at the scattering object and the light of the light line that is specularly reflected at the specularly reflective object are captured. Advantageous embodiments of the invention consist in capturing the light scattered at the scattering object after specular reflection at the specularly reflective object and/or capturing the light specularly reflected at the specularly reflective object after scattering at the scattering object. The method according to the invention can be used particularly in distance measurement or distance regulation between a funnel surrounding an ingot and a silicon melt in a crystal pulling installation.