SYSTEM AND METHOD FOR PROVIDING THERMAL MANAGEMENT OF AN OBSCURED LASER SYSTEM
According to an embodiment of the disclosure, a system for providing thermal management of an obscured laser system is provided that includes a primary mirror, a secondary mirror, and a plurality of energy redirectors. The primary mirror is configured to reflect beam energy for the laser system. The...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | According to an embodiment of the disclosure, a system for providing thermal management of an obscured laser system is provided that includes a primary mirror, a secondary mirror, and a plurality of energy redirectors. The primary mirror is configured to reflect beam energy for the laser system. The secondary mirror is configured to function as a limiting aperture for the laser system and is aligned on-axis with respect to the primary mirror. The energy redirectors are each configured to redirect energy away from a corresponding obscuration and out of the laser system. |
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