Method of forming a target for deposition of doped dielectric films by sputtering
The present invention discloses a method in which a selection is made for a first major constituent, a second major constituent and a minor constituent for forming a desired ceramic material. The method can include mixing the first major constituent, the second major constituent and the minor consti...
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Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present invention discloses a method in which a selection is made for a first major constituent, a second major constituent and a minor constituent for forming a desired ceramic material. The method can include mixing the first major constituent, the second major constituent and the minor constituent in a single mixing step to provide a mixture of constituents. The method can include drying the mixture of constituents to provide a dried mixture of constituents and calcining the dried mixture of constituents. The method can include processing the calcinated mixture of constituents to provide a powder of constituents. Other embodiments are disclosed. |
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