MIRROR HAVING A MAGNETRON-SPUTTERED SILVER LAYER
The invention relates to a method for manufacturing a mirror comprising the depositing of a layer of silver by magnetron cathode sputtering from a silver target area on a substrate in a deposition atmosphere comprising a rare gas, wherein the product of the deposition atmosphere pressure by the dist...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to a method for manufacturing a mirror comprising the depositing of a layer of silver by magnetron cathode sputtering from a silver target area on a substrate in a deposition atmosphere comprising a rare gas, wherein the product of the deposition atmosphere pressure by the distance between the target area and the substrate is comprised between l.5 Pa.cm and 7 Pa.cm. Very highly reflective mirrors, greater than 70% between 295 nm and 2500 nm (measured according to the ISO 9050 standard, air mass 1.5) are thus obtained. They are particularly adapted to reflecting sunlight for collecting solar energy. |
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