System for tungsten hexafluoride recovery and reuse

Condensable materials, such as but not limited to tungsten fluoride (WF 6 ), can be used deposit films in a chemical vapor deposition (CVD) process. Described herein are methods to collect and reuse the condensable materials that are unreacted in the production process rather than treat these materi...

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Bibliographische Detailangaben
Hauptverfasser:	JOHNSON, ANDREW DAVID, CASTEEL, JR., WILLIAM JACK, AHN, HEUI-BOK, AGARWAL, RAJIV KRISHAN, KARWACKI, JR., EUGENE JOSEPH, WINCHESTER, DAVID CHARLES, LEHMANN, JOHN FRANCIS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	Condensable materials, such as but not limited to tungsten fluoride (WF 6 ), can be used deposit films in a chemical vapor deposition (CVD) process. Described herein are methods to collect and reuse the condensable materials that are unreacted in the production process rather than treat these materials as waste. In one embodiment, when a condensable material, such as gaseous WF 6 , is not supplied to the CVD reactor, it is redirected to a recovery cabinet for capture.