GAS BARRIER FILM

The purpose of the present invention is to provide a gas barrier film which has high gas barrier performance and excellent repeated reproducibility of the gas barrier performance. A gas barrier film of the present invention comprises three inorganic compound layers (layer [A], layer [B] and layer [C...

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Bibliographische Detailangaben
Hauptverfasser:	UEBAYASHI, HIROYUKI, YOSHIDA, MINORU
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a gas barrier film which has high gas barrier performance and excellent repeated reproducibility of the gas barrier performance. A gas barrier film of the present invention comprises three inorganic compound layers (layer [A], layer [B] and layer [C]) that are sequentially arranged in this order on at least one surface of a polymer film base. This gas barrier film is characterized in that the layer [B] has a thickness of 0.2-20 nm and a density that is higher than those of the layer [A] and the layer [C].