CORNER CUT MASK

A mask structure configured for deposition of a layer on a rectangular substrate, e.g. an edge exclusion mask configured for deposition of a layer on a rectangular substrate is described. The mask structure includes a mask frame adapted for masking the edge of the substrate during layer deposition,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HANIKA, MARKUS, LINDENBERG, RALPH, ZENGEL, CLAUS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A mask structure configured for deposition of a layer on a rectangular substrate, e.g. an edge exclusion mask configured for deposition of a layer on a rectangular substrate is described. The mask structure includes a mask frame adapted for masking the edge of the substrate during layer deposition, wherein the mask frame comprises at least two mask frame side portions forming a corner in a corner area there between, wherein the mask frame is shaped to overlap the edge of the rectangular substrate such that a first overlap width at the side portions is larger than a second overlap width in the corner area.