Method for depositing a target material onto a sensitive material

The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition...

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Hauptverfasser: Janssens, Jan Arnaud, Dekkers, Jan Matthijn
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creator Janssens, Jan Arnaud
Dekkers, Jan Matthijn
description The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition method; - depositing a first layer of target material on the sensitive material, while maintaining the maximum particle velocity of the deposited particles below a preset value; and - depositing a second layer of target material on the first layer of target material, while the maximum particle velocity of the deposited particles is above the preset value. The invention also relates to an intermediate product and to an organic light emitting diode.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2722412B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2722412B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2722412B13</originalsourceid><addsrcrecordid>eNrjZHD0TS3JyE9RSMsvUkhJLcgvzizJzEtXSFQoSSxKTy1RyE0sSS3KTMxRyM8ryQcKF6fmgZSUpcJleBhY0xJzilN5oTQ3g4Kba4izhy7QtPjU4oLE5NS81JJ41wAjcyMjE0MjJ0NjIpQAAJy3MTk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for depositing a target material onto a sensitive material</title><source>esp@cenet</source><creator>Janssens, Jan Arnaud ; Dekkers, Jan Matthijn</creator><creatorcontrib>Janssens, Jan Arnaud ; Dekkers, Jan Matthijn</creatorcontrib><description>The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition method; - depositing a first layer of target material on the sensitive material, while maintaining the maximum particle velocity of the deposited particles below a preset value; and - depositing a second layer of target material on the first layer of target material, while the maximum particle velocity of the deposited particles is above the preset value. The invention also relates to an intermediate product and to an organic light emitting diode.</description><language>eng ; fre ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180425&amp;DB=EPODOC&amp;CC=EP&amp;NR=2722412B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20180425&amp;DB=EPODOC&amp;CC=EP&amp;NR=2722412B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Janssens, Jan Arnaud</creatorcontrib><creatorcontrib>Dekkers, Jan Matthijn</creatorcontrib><title>Method for depositing a target material onto a sensitive material</title><description>The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition method; - depositing a first layer of target material on the sensitive material, while maintaining the maximum particle velocity of the deposited particles below a preset value; and - depositing a second layer of target material on the first layer of target material, while the maximum particle velocity of the deposited particles is above the preset value. The invention also relates to an intermediate product and to an organic light emitting diode.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD0TS3JyE9RSMsvUkhJLcgvzizJzEtXSFQoSSxKTy1RyE0sSS3KTMxRyM8ryQcKF6fmgZSUpcJleBhY0xJzilN5oTQ3g4Kba4izhy7QtPjU4oLE5NS81JJ41wAjcyMjE0MjJ0NjIpQAAJy3MTk</recordid><startdate>20180425</startdate><enddate>20180425</enddate><creator>Janssens, Jan Arnaud</creator><creator>Dekkers, Jan Matthijn</creator><scope>EVB</scope></search><sort><creationdate>20180425</creationdate><title>Method for depositing a target material onto a sensitive material</title><author>Janssens, Jan Arnaud ; Dekkers, Jan Matthijn</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2722412B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2018</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Janssens, Jan Arnaud</creatorcontrib><creatorcontrib>Dekkers, Jan Matthijn</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Janssens, Jan Arnaud</au><au>Dekkers, Jan Matthijn</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for depositing a target material onto a sensitive material</title><date>2018-04-25</date><risdate>2018</risdate><abstract>The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition method; - depositing a first layer of target material on the sensitive material, while maintaining the maximum particle velocity of the deposited particles below a preset value; and - depositing a second layer of target material on the first layer of target material, while the maximum particle velocity of the deposited particles is above the preset value. The invention also relates to an intermediate product and to an organic light emitting diode.</abstract><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Method for depositing a target material onto a sensitive material
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T10%3A11%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Janssens,%20Jan%20Arnaud&rft.date=2018-04-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2722412B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true