Method for depositing a target material onto a sensitive material

The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Janssens, Jan Arnaud, Dekkers, Jan Matthijn
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a method for depositing a target material onto a sensitive material, which method comprises the steps of: - providing a substrate with a sensitive material, like an emissive electroluminescent layer; - creating a vapor plume of target material by a physical vapor deposition method; - depositing a first layer of target material on the sensitive material, while maintaining the maximum particle velocity of the deposited particles below a preset value; and - depositing a second layer of target material on the first layer of target material, while the maximum particle velocity of the deposited particles is above the preset value. The invention also relates to an intermediate product and to an organic light emitting diode.