ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING A DEVICE
An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements ar...
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| creator | KATO Kinya MIYAKE Norio |
| description | An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane and controlled individually, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a change of a polarization state to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the change of the polarization state being different from a change of the polarization state given to a second light beam passes through a second area in the intersecting plane, the second area being different from the first area; and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane in the optical path on the illumination objective surface side with respect to the first plane or in an optical path on a light source side with respect to the first plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system. |
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The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane and controlled individually, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a change of a polarization state to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the change of the polarization state being different from a change of the polarization state given to a second light beam passes through a second area in the intersecting plane, the second area being different from the first area; and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane in the optical path on the illumination objective surface side with respect to the first plane or in an optical path on a light source side with respect to the first plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190508&DB=EPODOC&CC=EP&NR=2720253B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190508&DB=EPODOC&CC=EP&NR=2720253B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KATO Kinya</creatorcontrib><creatorcontrib>MIYAKE Norio</creatorcontrib><title>ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING A DEVICE</title><description>An illumination optical system having high degree of freedom regarding change of polarization state. 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The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane and controlled individually, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a change of a polarization state to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the change of the polarization state being different from a change of the polarization state given to a second light beam passes through a second area in the intersecting plane, the second area being different from the first area; and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane in the optical path on the illumination objective surface side with respect to the first plane or in an optical path on a light source side with respect to the first plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING A DEVICE |
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