ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING A DEVICE

An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements ar...

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Hauptverfasser: KATO Kinya, MIYAKE Norio
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane and controlled individually, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a change of a polarization state to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the change of the polarization state being different from a change of the polarization state given to a second light beam passes through a second area in the intersecting plane, the second area being different from the first area; and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane in the optical path on the illumination objective surface side with respect to the first plane or in an optical path on a light source side with respect to the first plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system.