ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING A DEVICE
An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements ar...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | An illumination optical system having high degree of freedom regarding change of polarization state. The illumination optical system for illuminating an illumination objective surface with light from a light source includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane and controlled individually, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a change of a polarization state to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the change of the polarization state being different from a change of the polarization state given to a second light beam passes through a second area in the intersecting plane, the second area being different from the first area; and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane in the optical path on the illumination objective surface side with respect to the first plane or in an optical path on a light source side with respect to the first plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system. |
---|