SYSTEMS AND METHODS FOR ADJUSTING OVEN COOKING ZONES
A bidirectional flow system for a cooking oven is provided. The flow system comprises: an oven chamber (26) having a first cooking zone (82; 182) in fluid communication with a second cooking zone (84; 184), the oven chamber having at least a floor, a ceiling, and a mezzanine (48, 80; 148; 180) for d...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A bidirectional flow system for a cooking oven is provided. The flow system comprises: an oven chamber (26) having a first cooking zone (82; 182) in fluid communication with a second cooking zone (84; 184), the oven chamber having at least a floor, a ceiling, and a mezzanine (48, 80; 148; 180) for dividing the first and second cooking zones (82, 84; 182, 184); a gas circulation system (24) for supplying gaseous cooking medium initially to either of the first or second cooking zone; and a return assembly (32) for receiving returned gaseous cooking medium, wherein the return assembly includes a plurality of louvers (40, 42, 44, 46) movable between a first position and second position to receive returned gaseous cooking medium from the other of the first or second cooking zone. A method of cooking during a cooking cycle by changing flow direction of gaseous cooking medium in a cooking oven chamber is also provided. |
---|