DEVICE AND SYSTEM FOR DETERMINING, OPTIMIZING, OR MONITORING AT LEAST ONE PROCESS PARAMETER

An apparatus for determining or monitoring at least one process variable which comprises a sensor element, measuring electronics, at least one control/evaluating/calculating unit arranged removed from the measuring unit and/or an in/output unit arranged removed from the measuring unit and the contro...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BARET, MARC, ALTENDORF, MATTHIAS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING
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Beschreibung
Zusammenfassung:	An apparatus for determining or monitoring at least one process variable which comprises a sensor element, measuring electronics, at least one control/evaluating/calculating unit arranged removed from the measuring unit and/or an in/output unit arranged removed from the measuring unit and the control/evaluating/calculating unit. The control/evaluating/calculating unit and the in/output unit are connected with the measuring unit via a first interface, respectively a second interface, wherein the measuring electronics operates the sensor element and forwards the measurement signals via the interfaces to the control/evaluating/calculating unit as unprocessed, raw, measured values, and wherein the control/evaluating/calculating unit arranged removed from the measuring unit determines, improves and/or monitors the process variable based on the raw, measured values and makes such available via the in/output unit.