Method of manufacturing a graphene monolayer on insulating substrates
A method of manufacturing a graphene monolayer on insulating substrates from CVD graphene synthesis, wherein a metal foil (3) catalyst with a top graphene layer (1) and a bottom graphene layer (2) is obtained, by comprising the steps of: - Applying an adhesive tape (4) to the bottom graphene layer (...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method of manufacturing a graphene monolayer on insulating substrates from CVD graphene synthesis, wherein a metal foil (3) catalyst with a top graphene layer (1) and a bottom graphene layer (2) is obtained, by comprising the steps of:
- Applying an adhesive tape (4) to the bottom graphene layer (2) deposited at the bottom of the metal foil (3) in the CVD graphene synthesis by a roller,
- detaching the adhesive tape (4) and the bottom graphene layer (2) from the copper foil (3) via the application of heat, from 1°C up to 5°C higher than the release temperature of the adhesive tape (4) so that the adhesive layer (4) with the bottom graphene layer (2) can be removed, obtaining a metal foil (3) with a top graphene layer (2) sample, and
- transfer the top graphene layer (1) onto a substrate (6) via a sacrificial protective layer (5). |
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