METHOD OF PREPARING A DIORGANODIHALOSILANE

A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (i) treating a preformed metal silicide with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature from 300 to 1400° C. to form a treated metal silicide, wherein t...

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Bibliographische Detailangaben
Hauptverfasser: ANDERSON, KURT, E, WINELAND, JONATHAN, DAVID, KATSOULIS, DIMITRIS, HALL, CHARLES, ALAN, DASH, ASWINI, K
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method of preparing a diorganodihalosilane, the method comprising the following separate and consecutive steps: (i) treating a preformed metal silicide with a mixture comprising hydrogen gas and a silicon tetrahalide at a temperature from 300 to 1400° C. to form a treated metal silicide, wherein the preformed metal silicide comprises a metal selected from at least one of Ni, Pd, or Pt; and (ii) reacting the treated metal silicide with an organohalide according to the formula RX at a temperature from 250 to 700° C. to form a diorganodihalosilane, wherein R is C1-C10 hydrocarbyl and X is halo.