A METHOD FOR APPLYING AND EXPOSING COATING OR INK COMPOSITIONS ON SUBSTRATES TO RADIATION AND THE PRODUCT THEREOF

The present invention describes a two-sided radiation exposure method including a step of applying a coating or ink composition on a surface of a nonporous substrate. The applied coating or ink composition surface of the nonporous substrate is exposed to radiation one or more times. In addition, a n...

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Bibliographische Detailangaben
Hauptverfasser:	ZHANG, Yuemei, ADHIKARI, Prasad, K
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL COLOUR PRINTING LINING MACHINES PERFORMING OPERATIONS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	The present invention describes a two-sided radiation exposure method including a step of applying a coating or ink composition on a surface of a nonporous substrate. The applied coating or ink composition surface of the nonporous substrate is exposed to radiation one or more times. In addition, a non-applied surface of the nonporous substrate is exposed to radiation one or more times. The two-sided radiation exposure method improves adhesion and/or curing properties of the coating or ink composition applied on the nonporous substrate. The present invention also describes a radiation exposed, nonporous substrate with a coating or ink composition applied on a surface thereof produced by the steps of the above-mentioned method.