Vacuum deposition apparatus
Provided is a vacuum deposition apparatus (1) including a vacuum chamber (4), a deposition roller (2) that is arranged in the vacuum chamber, and winds a substrate (W) in a sheet form subject to deposition, and a magnetic field generation unit (8) that is provided inside the deposition roller, and g...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Provided is a vacuum deposition apparatus (1) including a vacuum chamber (4), a deposition roller (2) that is arranged in the vacuum chamber, and winds a substrate (W) in a sheet form subject to deposition, and a magnetic field generation unit (8) that is provided inside the deposition roller, and generates a magnetic field on a surface of the deposition roller, where the magnetic field generation unit includes an inside magnet arranged along an axial direction of the deposition roller and an outside magnet having a polarity opposite to the inside magnet and surrounding, in an annular form, the inside magnet, and the inside magnet is formed so as to be narrower in width along the axial direction of the deposition roller than a width of an extent of winding of the substrate W on the deposition roller in a projection viewed from a deposition surface of the substrate, and is arranged within the extent of the winding of the substrate W. |
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