Facility and method for supplying liquid xenon

The installation (1) has a thermal insulation equipment arranged to thermically insulate a container (4) by a layer (14). The container includes walls (6) whose form and thickness (E6) are selected such that the container withstands working pressure developed by xenon mass working at a gas state at...

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Bibliographische Detailangaben
Hauptverfasser: Durand, Fabien, Chen, Wan-Ting, Stutzmann, Jean-Sébastien, Briend, Pierre, Thers, Dominique, Aprile, Elena
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The installation (1) has a thermal insulation equipment arranged to thermically insulate a container (4) by a layer (14). The container includes walls (6) whose form and thickness (E6) are selected such that the container withstands working pressure developed by xenon mass working at a gas state at temperature of approximately 300 Kelvin. The pressure lies between 60 bars and 80 bars. An overpressure limiting device is connected to the container and calibrated to limit overpressure to a value greater or equal to the working pressure. An independent claim is also included for a method for supplying liquid xenon to a cryostat for an imaging system or a detection system.