AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS

An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for...

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Hauptverfasser: LI, YUZHUO, NOLLER, BASTIAN, VENKATARAMAN, SHYAM SUNDAR, USMAN IBRAHIM, SHEIK ANSAR, FRANZ, DIANA, PINDER, HARVEY WAYNE
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creator LI, YUZHUO
NOLLER, BASTIAN
VENKATARAMAN, SHYAM SUNDAR
USMAN IBRAHIM, SHEIK ANSAR
FRANZ, DIANA
PINDER, HARVEY WAYNE
description An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2614122A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2614122A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2614122A43</originalsourceid><addsrcrecordid>eNqNyj0LwjAQBuAuDqL-h2xOQVqLe2yiPWjvqneB1qUUiZNosf5_rCK4Or0fPNPoYQ7ekWdVUQGcA-5VRmVFDAKEPA4UA_j-UbPfsoB4cVZZMCeH4MuxUQ3WsTJoV3RUuNR5Y49UN_qHPkSxKYTn0eTSXYew-OYsUjsnWa5Df2_D0HfncAvP1lXJJk7jJDHp-g_yAlgkOLU</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS</title><source>esp@cenet</source><creator>LI, YUZHUO ; NOLLER, BASTIAN ; VENKATARAMAN, SHYAM SUNDAR ; USMAN IBRAHIM, SHEIK ANSAR ; FRANZ, DIANA ; PINDER, HARVEY WAYNE</creator><creatorcontrib>LI, YUZHUO ; NOLLER, BASTIAN ; VENKATARAMAN, SHYAM SUNDAR ; USMAN IBRAHIM, SHEIK ANSAR ; FRANZ, DIANA ; PINDER, HARVEY WAYNE</creatorcontrib><description>An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.</description><language>eng ; fre ; ger</language><subject>ADHESIVES ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SEMICONDUCTOR DEVICES ; SKI WAXES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140115&amp;DB=EPODOC&amp;CC=EP&amp;NR=2614122A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20140115&amp;DB=EPODOC&amp;CC=EP&amp;NR=2614122A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LI, YUZHUO</creatorcontrib><creatorcontrib>NOLLER, BASTIAN</creatorcontrib><creatorcontrib>VENKATARAMAN, SHYAM SUNDAR</creatorcontrib><creatorcontrib>USMAN IBRAHIM, SHEIK ANSAR</creatorcontrib><creatorcontrib>FRANZ, DIANA</creatorcontrib><creatorcontrib>PINDER, HARVEY WAYNE</creatorcontrib><title>AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS</title><description>An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.</description><subject>ADHESIVES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SKI WAXES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyj0LwjAQBuAuDqL-h2xOQVqLe2yiPWjvqneB1qUUiZNosf5_rCK4Or0fPNPoYQ7ekWdVUQGcA-5VRmVFDAKEPA4UA_j-UbPfsoB4cVZZMCeH4MuxUQ3WsTJoV3RUuNR5Y49UN_qHPkSxKYTn0eTSXYew-OYsUjsnWa5Df2_D0HfncAvP1lXJJk7jJDHp-g_yAlgkOLU</recordid><startdate>20140115</startdate><enddate>20140115</enddate><creator>LI, YUZHUO</creator><creator>NOLLER, BASTIAN</creator><creator>VENKATARAMAN, SHYAM SUNDAR</creator><creator>USMAN IBRAHIM, SHEIK ANSAR</creator><creator>FRANZ, DIANA</creator><creator>PINDER, HARVEY WAYNE</creator><scope>EVB</scope></search><sort><creationdate>20140115</creationdate><title>AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS</title><author>LI, YUZHUO ; NOLLER, BASTIAN ; VENKATARAMAN, SHYAM SUNDAR ; USMAN IBRAHIM, SHEIK ANSAR ; FRANZ, DIANA ; PINDER, HARVEY WAYNE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2614122A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2014</creationdate><topic>ADHESIVES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SKI WAXES</topic><toplevel>online_resources</toplevel><creatorcontrib>LI, YUZHUO</creatorcontrib><creatorcontrib>NOLLER, BASTIAN</creatorcontrib><creatorcontrib>VENKATARAMAN, SHYAM SUNDAR</creatorcontrib><creatorcontrib>USMAN IBRAHIM, SHEIK ANSAR</creatorcontrib><creatorcontrib>FRANZ, DIANA</creatorcontrib><creatorcontrib>PINDER, HARVEY WAYNE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LI, YUZHUO</au><au>NOLLER, BASTIAN</au><au>VENKATARAMAN, SHYAM SUNDAR</au><au>USMAN IBRAHIM, SHEIK ANSAR</au><au>FRANZ, DIANA</au><au>PINDER, HARVEY WAYNE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS</title><date>2014-01-15</date><risdate>2014</risdate><abstract>An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.</abstract><oa>free_for_read</oa></addata></record>
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subjects ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SEMICONDUCTOR DEVICES
SKI WAXES
title AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-16T00%3A21%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LI,%20YUZHUO&rft.date=2014-01-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP2614122A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true