METHOD AND APPARATUS FOR MEASURING SHAPE OF SURFACE TO BE INSPECTED, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT

Provided is a measurement method or apparatus that can reduce the time for measuring the shape of an entire test surface. Each of a plurality of measurement ranges is set so that one measurement range overlaps a portion of at least another measurement range to form an overlap region, each measuremen...

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1. Verfasser: OSAKI YUMIKO
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Provided is a measurement method or apparatus that can reduce the time for measuring the shape of an entire test surface. Each of a plurality of measurement ranges is set so that one measurement range overlaps a portion of at least another measurement range to form an overlap region, each measurement range being a portion of the test surface. Then, the shape of the test surface is measured at a first resolution in a first measurement range among the plurality of measurement ranges, and is measured at a second resolution in a second measurement range. Pieces of data of the shapes of the test surface in the plurality of measurement ranges are stitched using the resulting measurement data to calculate the shape of the test surface,