POWDER, SINTERED BODY AND SPUTTERING TARGET, EACH CONTAINING ELEMENTS CU, IN, GA AND SE, AND METHOD FOR PRODUCING THE POWDER
The present invention provides a Cu-In-Ga-Se powder containing Cu, In, Ga and Se in which cracks do not occur during sintering or processing, and a sintered body and sputtering target, each using the same. The present invention relates to a powder containing Cu, In Ga and Se, which contains a Cu-In-...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present invention provides a Cu-In-Ga-Se powder containing Cu, In, Ga and Se in which cracks do not occur during sintering or processing, and a sintered body and sputtering target, each using the same. The present invention relates to a powder containing Cu, In Ga and Se, which contains a Cu-In-Ga-Se compound and/or a Cu-In-Se compound in an amount of 60 mass% or more in total. The powder of the present invention preferably contains an In-Se compound in an amount of 20 mass% or less and/or a Cu-In compound in an amount of 20 mass% or less. |
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