CLEANING MECHANISM WITH TANDEM MOVEMENT OVER EMITTER AND COLLECTOR SURFACES

An apparatus for tandem cleaning of an emitter electrode and collector electrode in electrohydrodynamic fluid accelerator and precipitator devices via movement of a cleaning mechanism including respective cleaning surfaces positioned to frictionally engage the emitter electrode and collector electro...

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Hauptverfasser: HONER, KENNETH A, JEWELL-LARSEN, NELS, SCHWIEBERT, MATTHEW K
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:An apparatus for tandem cleaning of an emitter electrode and collector electrode in electrohydrodynamic fluid accelerator and precipitator devices via movement of a cleaning mechanism including respective cleaning surfaces positioned to frictionally engage the emitter electrode and collector electrode. The cleaning mechanism causes the respective cleaning surfaces to travel along a longitudinal extent of the emitter electrode and, in tandem, over a major dimension of the collector electrode to remove detrimental material from respective electrode surfaces. Alternatively, the electrodes can be transited in tandem in frictional engagement with a fixed cleaning mechanism in the same or opposite directions. A conditioning material is optionally deposited on an electrode to at least partially mitigate ozone, erosion, corrosion, oxidation, or dendrite formation on the electrodes. The conditioning material can include an ozone reducer.