Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

A particle-optical arrangement, comprising: at least one charged-particle source 329 for generating at least one beam 309 of charged particles, at least one multi-aperture plate 313 having a plurality of apertures formed in the plate, wherein the plurality of apertures being arranged in a first patt...

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Bibliographische Detailangaben
Hauptverfasser:	Kienzle, Oliver, Müller, Heiko, Haider, Maximilian, Uhlemann, Stephan, Kemen, Thomas, Rogers, Steven, Casares, Antonio, Knippelmeyer, Rainer
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES IRRADIATION DEVICES MEASURING NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR TESTING
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Beschreibung
Zusammenfassung:	A particle-optical arrangement, comprising: at least one charged-particle source 329 for generating at least one beam 309 of charged particles, at least one multi-aperture plate 313 having a plurality of apertures formed in the plate, wherein the plurality of apertures being arranged in a first pattern, wherein a plurality of charged-particle beamlets 3 is formed from the beam of charged particles downstream of the aperture plate; and a first focusing lens 303 providing a focusing field in a region between the charged-particle source and the multi-aperture plate; wherein the beam of charged particles is a divergent beam 311 in a region immediately upstream of the multi-aperture plate.