TWO-WIRE INDUSTRIAL PROCESS FIELD DEVICE MAXIMIZING THE POWER AVAILABLE TO THE CIRCUITRY OF THE DEVICE AT MINIMUM CONTROL LOOP CURRENT

A process field device for use in monitoring or controlling an industrial process includes first and second loop terminals configured to couple to a two-wire industrial process control loop. Field device circuitry is configured to monitor or control a process variable of the industrial process. The...

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Bibliographische Detailangaben
1. Verfasser: SCHULTE, JOHN, P
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A process field device for use in monitoring or controlling an industrial process includes first and second loop terminals configured to couple to a two-wire industrial process control loop. Field device circuitry is configured to monitor or control a process variable of the industrial process. The field device circuitry is powered by power connections from the two-wire industrial process control loop. A current regulator is connected in series with the two-wire industrial process control loop, the first and second loop terminals and the field device circuitry. The current regulator is configured to control a loop current flowing through the two-wire process control loop. A voltage regulator is connected in parallel with the current regulator and in series with the two-wire industrial process control loop, first and second loop terminals and field device circuitry. The voltage regulator is configured to control a voltage across the field device circuitry.