Binary silica-titania glass articles having a ternary doped silica-titania critical zone

In one aspect the disclosure is directed to a binary silica-titania blank having a CTE of 0 ± 30 ppb/°C or less and a insert made of silica-titania-dopant(s) glass in the critical zone, wherein the dopants are selected from the group consisting of aluminum oxide, selected transition metal oxides, an...

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Bibliographische Detailangaben
1. Verfasser:	ANNAMALAI, SEZHIAN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	In one aspect the disclosure is directed to a binary silica-titania blank having a CTE of 0 ± 30 ppb/°C or less and a insert made of silica-titania-dopant(s) glass in the critical zone, wherein the dopants are selected from the group consisting of aluminum oxide, selected transition metal oxides, and amount of the dopants is in the range of 0.05 wt.% to 8 wt.% and the insert is fusion bonded to the blank with or without a frit. In various embodiments the dopants are selected from the group consisting of 0.25 wt.% to 8 wt.% Al 2 O 3 , 0.05 wt.% to 3 wt.% Nb 2 O 5 , and 0.25 wt.% to 6 wt.% Ta 2 O 5 .