MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD OF MANUFACTURING PRINTING PLATE

This invention is concerning a multibeam exposure scanning method and apparatus, and a method of manufacturing a printing plate. The problem to be solved is that angular small convex points are to be stably formed through multibeam exposure. The above problem is to be solved by a multibeam exposure...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	MIYAGAWA, ICHIROU
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	This invention is concerning a multibeam exposure scanning method and apparatus, and a method of manufacturing a printing plate. The problem to be solved is that angular small convex points are to be stably formed through multibeam exposure. The above problem is to be solved by a multibeam exposure scanning method for engraving the surface of a recording medium by simultaneously emitting beams to expose and scan the same scanning line two or more times. The multibeam exposure scanning method includes: exposing a first region with a first amount of light and exposing a second region with a second amount of light in a single scanning operation, the first region being adjacent to a target planar shape to be left on the exposure surface of the recording medium, the second region surrounding the first region; and, in at least one of a second exposure and scanning operation and succeeding exposure and scanning operations, exposing and scanning the second region with a larger amount of light than the amount of light used in the first exposure and scanning operation.