LASER ETCHING SYSTEM AND METHOD

A system and method of laser etching materials is provided. A series of optical elements are used to reduce the spot size of a laser for a given field size, allowing fine detailed graphics associated with small spot sizes to be etched with larger field sizes. This may be accomplished, for example, b...

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Bibliographische Detailangaben
1. Verfasser:	COSTIN, SR., DARRYL J
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CLADDING OR PLATING BY SOLDERING OR WELDING COLOUR PRINTING CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING LINING MACHINES MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES SOLDERING OR UNSOLDERING STAMPS TRANSPORTING TYPEWRITERS WELDING WORKING BY LASER BEAM
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Beschreibung
Zusammenfassung:	A system and method of laser etching materials is provided. A series of optical elements are used to reduce the spot size of a laser for a given field size, allowing fine detailed graphics associated with small spot sizes to be etched with larger field sizes. This may be accomplished, for example, by increasing the size of a laser beam beyond its natural state before passing the beam through a focusing lens, such expander lens, focus lens and mirror system increased in size so as to generate a laser spot size less than or equal to 0.5 mm at a field size equal to or larger than 1500 mm square.