Illumination lens for projection lithography

The lens (4) has a field facing mirror (20) provided with a set of field faces, and a pupil facing mirror (21) provided with a set of pupil faces. The pupil faces serve for imaging each of the field faces in an object field (5). A single-mirror array (17) has an individually controlled mirror that i...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Bieling, Stig, Wangler, Johannes, Degünther, Markus
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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