Illumination lens for projection lithography

The lens (4) has a field facing mirror (20) provided with a set of field faces, and a pupil facing mirror (21) provided with a set of pupil faces. The pupil faces serve for imaging each of the field faces in an object field (5). A single-mirror array (17) has an individually controlled mirror that i...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Bieling, Stig, Wangler, Johannes, Degünther, Markus
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The lens (4) has a field facing mirror (20) provided with a set of field faces, and a pupil facing mirror (21) provided with a set of pupil faces. The pupil faces serve for imaging each of the field faces in an object field (5). A single-mirror array (17) has an individually controlled mirror that is arranged in an illumination light beam path in front of the field facing mirror. The individually controlled mirror is arranged on a curved base plate through the single-mirror array such that the individually controlled mirror illuminates within a tolerance range. The single-mirror array is formed as a micro-electro mechanical system (MEMS). Independent claims are also included for the following: (1) a lighting system (2) a projection exposure system (3) a method for manufacturing structured elements.