CATALYTIC CVD DEVICE, METHOD FOR FORMATION OF FILM, PROCESS FOR PRODUCTION OF SOLAR CELL, AND SUBSTRATE HOLDER

In a catalytic CVD equipment 100, a holder 300 includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire 11 toward the side of the substrate 200.

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Bibliographische Detailangaben
Hauptverfasser:	OGATA, Hideyuki, SHIMA, Masaki, OSONO, Shuji, WAKAMIYA, Yoshinori, OKAYAMA, Satohiro
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	In a catalytic CVD equipment 100, a holder 300 includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire 11 toward the side of the substrate 200.