PROCESS DEVICE WITH SAMPLING SKEW ERROR CORRECTION

An industrial process device for monitoring or controlling an industrial process includes a first input configured to receive a first plurality of samples related to a first process variable and a second input configured to receive a second plurality of samples related to a second process variable....

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Bibliographische Detailangaben
1. Verfasser:	SCHULTE, John, P
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL METERING BY VOLUME MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING TESTING
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Beschreibung
Zusammenfassung:	An industrial process device for monitoring or controlling an industrial process includes a first input configured to receive a first plurality of samples related to a first process variable and a second input configured to receive a second plurality of samples related to a second process variable. Compensation circuitry is configured to compensate for a time difference between the first plurality of samples and the second plurality of samples and provide a compensated output related to at least one of the first and second process variables. The compensated output can comprise, or can be used to calculate a third process variable. The third process variable can be used to monitor or control the industrial process.