LASER-REFLECTIVE MASK AND METHOD FOR MANUFACTURING SAME

There are provided a laser reflective mask and a fabricating method thereof, in which reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and then the remaining reflective layer laminated on the other region except for the portion filled in the reflective layer filling groove are removed through a chemical mechanical polishing (CMP) process, or a lift-off process using irradiation with the laser beam or an etchant, so that a reflective layer pattern configured to be filled in the reflective layer filling groove may be formed, thereby capable of not only facilitating a fabricating process of the laser reflective mask but also forming a more precise reflective layer pattern. A fabricating method of a laser reflective mask includes the steps of forming a sacrificial layer on top of a base substrate; recessing the sacrificial layer and the base substrate through an etching process of a region prearranged as a reflection region for a laser beam in the base substrate to form a sacrificial layer pattern and a reflective layer filling groove having a predetermined depth; alternately and repeatedly laminating first and second reflective layers having different reflectances on top of the base substrate on which the sacrificial layer pattern and the reflective layer filling groove are formed until the reflective layer filling groove is completely filled; removing the sacrificial layer pattern and the first and second reflective layers laminated on top of the sacrificial layer pattern through a laser lift-off process of irradiating the base substrate with the laser beam from a bottom surface of the base substrate to form a reflective layer pattern configured to be filled in the reflective layer filling groove; and removing the sacrificial layer pattern remaining on top of the base substrate.