Improved method for manufacturing a photovoltaic device comprising a TCO layer

The present invention is directed to a method for fabricating a photovoltaic device, comprising depositing a transparent conductive oxide (TCO) layer on a substrate, exposing the TCO layer to laser irradiation using a set of irradiation parameters, and exposing the laser irradiated TCO layer to an e...

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Bibliographische Detailangaben
Hauptverfasser:	EMERAUD, THIERRY, ROCA I CABARROCAS, PERE, JOHNSON, ERIK, PROD'HOMME, PATRICIA
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	The present invention is directed to a method for fabricating a photovoltaic device, comprising depositing a transparent conductive oxide (TCO) layer on a substrate, exposing the TCO layer to laser irradiation using a set of irradiation parameters, and exposing the laser irradiated TCO layer to an etching process using a set of etching parameters, characterized in that the irradiation parameters and the etching parameters are selected such that the haze% of the TCO layer increases compared to the as deposited TCO layer. Additionally, the present invention is directed to a TCO layer having a haze% of at least 20% for an incident light wavelength contained in the range between 350 and 1300 nm. Further the present invention is directed to a photovoltaic device comprising such TCO-layer.