Exposure unit and device for lithographic exposure

The illuminating unit (13) has a light source (5) e.g. mercury high pressure lamp, for radiating an illuminating light (7). A lens (3) e.g. collective lens, is arranged adjacent to a double sided lens array (1). Another double sided lens array (2) is arranged in a focal plane of the lens. Another le...

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Bibliographische Detailangaben
Hauptverfasser:	Stürzebecher, Lorenz, Harzendorf, Torsten, Zeitner, Uwe D
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The illuminating unit (13) has a light source (5) e.g. mercury high pressure lamp, for radiating an illuminating light (7). A lens (3) e.g. collective lens, is arranged adjacent to a double sided lens array (1). Another double sided lens array (2) is arranged in a focal plane of the lens. Another lens (4) is arranged adjacent to the latter lens array. A substrate (11) is coated with a radiation-sensitive polymer layer (10). A spacing (L) between a photomask (9) and the polymer layer is defined by a relationship based on a period of a periodical mask pattern (9b) and a wavelength of the light.