Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith

Bibliographische Detailangaben

Hauptverfasser:	TAMAOKI, HIROSHI, TAKAHASHI, TOSHIYA, TAKAHASHI, HIDENORI, TSUBAKI, HIDEAKI
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!