ILLUMINATION SYSTEM FOR USE IN A STEREOLITHOGRAPHY APPARATUS

The invention concerns an illumination system (30) for use in a stereolithography apparatus (1), comprising a planar support supporting a twodimensional array (32) of individually controllable wide-angle light-emitting diodes (LEDs) (34) comprising light emitting surfaces; and a multilens projector...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KOOISTRA, Jentske, D, VAES, Mark Herman Else, RIJFERS, Andries, KRUIZINGA, Borgert, JAMAR, Jacobus, Hubertus, Theodoor
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention concerns an illumination system (30) for use in a stereolithography apparatus (1), comprising a planar support supporting a twodimensional array (32) of individually controllable wide-angle light-emitting diodes (LEDs) (34) comprising light emitting surfaces; and a multilens projector array (40, 42) arranged relative to the array, and adapted to project the light-emitting surfaces of the LEDs onto a work area (16). The multilens projector array is arranged to project light from the LED array having a light emitting edge area focus error which is smaller than or equal to a light emitting central area focus error.