Method and apparatus for controlling depth of deposition of a solvent free funcitonal material in a receiver

A method and apparatus for delivering a functional material to a receiver includes a pressurized source (12) of solvent in a thermodynamically stable mixture with a functional material. The solvent is in a liquid state within the pressurized source. A discharge device (13) having an inlet and an out...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: IRVIN, GLEN. C. JR, RUEPING, JOHN E, SADASIVAN, SRIDHAR, MERZ, GARY E, JAGANNATHAN, SESHADRI, JAGANNATHAN, RAMESH
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A method and apparatus for delivering a functional material to a receiver includes a pressurized source (12) of solvent in a thermodynamically stable mixture with a functional material. The solvent is in a liquid state within the pressurized source. A discharge device (13) having an inlet and an outlet is connected to the pressurized source at the inlet such that the thermodynamically stable mixture is ejected from the outlet. A receiver (14) having a back is positioned a predetermined distance from the outlet of the discharge device. The solvent of the thermodynamically mixture evaporates at a location beyond the outlet of the discharge device and a predetermined amount of the functional material contacts the receiver at a predetermined distance from the back of the receiver.