Method and apparatus for controlling depth of deposition of a solvent free funcitonal material in a receiver
A method and apparatus for delivering a functional material to a receiver includes a pressurized source (12) of solvent in a thermodynamically stable mixture with a functional material. The solvent is in a liquid state within the pressurized source. A discharge device (13) having an inlet and an out...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method and apparatus for delivering a functional material to a receiver includes a pressurized source (12) of solvent in a thermodynamically stable mixture with a functional material. The solvent is in a liquid state within the pressurized source. A discharge device (13) having an inlet and an outlet is connected to the pressurized source at the inlet such that the thermodynamically stable mixture is ejected from the outlet. A receiver (14) having a back is positioned a predetermined distance from the outlet of the discharge device. The solvent of the thermodynamically mixture evaporates at a location beyond the outlet of the discharge device and a predetermined amount of the functional material contacts the receiver at a predetermined distance from the back of the receiver. |
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