CHEMICAL-MECHANICAL PLANARIZATION PAD INCLUDING PATTERNED STRUCTURAL DOMAINS

Bibliographische Detailangaben

Hauptverfasser:	WU, GUANGWEI, QIAO, SCOTT, XIN, WELLS, DAVID, ADAM, LEFEVRE, PAUL, HSU, OSCAR, K, MATHEW, ANOOP
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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