Device for positioning at least two objects, assemblies in particular multi-layer body assemblies, assembly for processing, in particular selenization, of objects, method for positioning at least two objects

The device (30e) has a spacer element (70e) for accommodating multi-layer bodies i.e. lower- and/or upper substrates (40, 50). The device is formed for accommodating the bodies such that a processing chamber (11) is formed between surfaces of the bodies to be processed for processing i.e. selenizati...

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Bibliographische Detailangaben
Hauptverfasser:	JOST, STEFAN, PALM, JOERG, FUERFANGER, MARTIN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	The device (30e) has a spacer element (70e) for accommodating multi-layer bodies i.e. lower- and/or upper substrates (40, 50). The device is formed for accommodating the bodies such that a processing chamber (11) is formed between surfaces of the bodies to be processed for processing i.e. selenization, of the bodies as a multi-layer body arrangement (28d) in a processing system. Another spacer element accommodates the former spacer element such that the multi-layer body arrangement is formed. The latter spacer element is partially arranged below the lower multi-layer body. Independent claims are also included for the following: (1) a multi-layer body arrangement comprising a device for positioning two objects (2) a system for processing two objects (3) a method for positioning two objects. Die Erfindung betrifft eine Vorrichtung zum Positionieren (30a bis 30g) von mindestens zwei Gegenständen, insbesondere von mindestens zwei Mehrschichtkörpern (40, 50), mit jeweils mindestens einer zu prozessierenden Oberfläche (44, 54), zum Prozessieren, insbesondere zum Selenisieren, der mindestens zwei Gegenstände in einer Prozessieranlage (10). Ferner sind vorgesehen Anordnungen, insbesondere Mehrschichtkörperanordnungen (28a bis 28e), eine Anlage (10) zum Prozessieren, insbesondere zum Selenisieren, von Gegenständen und entsprechende Verfahren zum Positionieren von mindestens zwei Gegenständen. Mit dem Gegenstand der Erfindung soll die thermische Prozessierung von Gegenständen, insbesondere von Mehrschichtkörpern, effizienter gestaltet werden. Somit lassen sich die Investitionskosten, insbesondere für entsprechende Anlagen, und damit auch die Produktionskosten senken.