DUAL METAL INTERCONNECTS

Embodiments of apparatus and methods for forming dual metal interconnects are described herein. Other embodiments may be described and claimed.

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Hauptverfasser: INDUKURI, Tejaswi, FAJARDO, Arnel M, O'BRIEN, Kevin, P, AKOLKAR, Rohan, N
Format: Patent
Sprache:eng ; fre ; ger
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creator INDUKURI, Tejaswi
FAJARDO, Arnel M
O'BRIEN, Kevin, P
AKOLKAR, Rohan, N
description Embodiments of apparatus and methods for forming dual metal interconnects are described herein. Other embodiments may be described and claimed.
format Patent
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language eng ; fre ; ger
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title DUAL METAL INTERCONNECTS
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