COATING SYSTEM

The invention provides a coating system for coating substrates in a cyclic mode. The process stations of the coating system are disposed in a circular fashion. A handling mechanism is provided for transferring the substrates between the process stations. The process stations comprise a lock for load...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SICHMANN, EGGO, HUBER, MARCO, HOHN, OLIVER, ROOS, BJOERN, BINKOWSKA, PATRICK, REISING, MICHAEL, BECKER, WOLFGANG, CORD, BERNHARD, KEMPF, STEFAN, WOHLFART, PETER, RUETH, EDGAR
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention provides a coating system for coating substrates in a cyclic mode. The process stations of the coating system are disposed in a circular fashion. A handling mechanism is provided for transferring the substrates between the process stations. The process stations comprise a lock for loading and unloading the substrates, at least two coating chambers, each of which comprises a plasma source for stationary coating of the substrate, and preferably a heating station.