EXTREME UV RADIATION REFLECTING ELEMENT COMPRISING A SPUTTER-RESISTANT MATERIAL

EXTREME UV RADIATION REFLECTING ELEMENT COMPRISING A SPUTTER-RESISTANT MATERIAL

The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of 5 nm and essentially made out of a material with a sputter resistance of 10 nm per 108 shots and whereby the second lay...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: METZMACHER, CHRISTOF
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of 5 nm and essentially made out of a material with a sputter resistance of 10 nm per 108 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.