METHOD FOR DEPOSITING A SCRATCH PROTECTION COATING ON A PLASTIC SUBSTRATE

The invention relates to a method for depositing a transparent scratch protection coating on a plastic substrate by means of plasma-enhanced chemical vapor deposition (PECVD), wherein at least one metal organic precursor and at least one reactive gas are fed into a vacuum chamber, wherein the plasma...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	FAHLAND, MATTHIAS, GLOESS, DANIEL, TAESCHNER, KERSTIN, GOTTFRIED, CHRISTIAN, BARTZSCH, HAGEN, FRACH, PETER
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON DIFFUSION TREATMENT OF METALLIC MATERIAL GENERAL PROCESSES OF COMPOUNDING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention relates to a method for depositing a transparent scratch protection coating on a plastic substrate by means of plasma-enhanced chemical vapor deposition (PECVD), wherein at least one metal organic precursor and at least one reactive gas are fed into a vacuum chamber, wherein the plasma is generated by means of a pulsed magnetron, and at least one layer having continuous or abrupt changes with regard to layer composition is deposited.