WATER-REACTIVE AL COMPOSITE MATERIAL, WATER-REACTIVE AL FILM, METHOD FOR PRODUCTION OF THE AL FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER

Provided herein are a water-reactive Al composite material comprising an Al raw material selected from the group consisting of 2NAl to 5NAl each containing Cu as an impurity of Al in an amount of not higher than 40 ppm, and at least one metal selected from the group consisting of In and Bi, in amoun...

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Bibliographische Detailangaben
Hauptverfasser:	SAITOU TOMOKO, KADOWAKI YUTAKA, LIM KENG WENG, MUSHIAKE KATSUHIKO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ALLOYS BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	Provided herein are a water-reactive Al composite material comprising an Al raw material selected from the group consisting of 2NAl to 5NAl each containing Cu as an impurity of Al in an amount of not higher than 40 ppm, and at least one metal selected from the group consisting of In and Bi, in amounts ranging from 2 to 5% by mass and 0.7 to 1.4% by mass, respectively, on the basis of the mass of Al; a water-reactive Al film produced using this composite material; a method for the production of this Al film; and a constituent member for a film-forming chamber, which is provided, on the surface, this water-reactive Al film.