Lithographic apparatus and device manufacturing method

A liquid supply system (24) for an immersion lithographic projection apparatus is disclosed in which a space (5) is defined between the projection system (PL), a barrier member (10) and a substrate (W). The barrier member (10) is not sealed such that, during use, immersion liquid is allowed to flow...

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Bibliographische Detailangaben
Hauptverfasser:	VAN SANTEN, HELMAR, KOLESNYCHENKO, ALEKSEY
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A liquid supply system (24) for an immersion lithographic projection apparatus is disclosed in which a space (5) is defined between the projection system (PL), a barrier member (10) and a substrate (W). The barrier member (10) is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member (10) and the substrate (W).