AN AQUEOUS SOLUTION FOR APPLYING TO A CHANNEL AND APPLYING METHOD

An aqueous solution containing a buffer and an organosilicone surfactant and a method of applying an aqueous solution containing a buffer and an organosilicone surfactant to a channel are presented. The aqueous solution includes a buffer and an organosilicone surfactant and may also include a blocki...

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Hauptverfasser: SHIH, YIHSHING, CHANG, WILLIAM, W.P
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:An aqueous solution containing a buffer and an organosilicone surfactant and a method of applying an aqueous solution containing a buffer and an organosilicone surfactant to a channel are presented. The aqueous solution includes a buffer and an organosilicone surfactant and may also include a blocking agent. The method includes providing an aqueous solution containing a buffer and an organosilicone surfactant, and applying the aqueous solution to the channel having the hydrophobic surfaces. The organosilicone surfactant is used to reduce surface tensions of the solution on the hydrophobic channel. The organosilicone surfactant is combined with the blocking agent for preventing an interaction between the surface of the channel and a component in the aqueous solution.