METHOD FOR THE PRODUCTION OF AN OPTOELECTRONIC COMPONENT USING THIN-FILM TECHNOLOGY

METHOD FOR THE PRODUCTION OF AN OPTOELECTRONIC COMPONENT USING THIN-FILM TECHNOLOGY

On an epitaxy substrate (1), a layer structure (5, 6, 7) provided for light-emitting diodes or other optoelectronic components using thin-film technology is produced and provided with a first connecting layer (2), which comprises one or a plurality of solder materials. A second connecting layer (3)...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PLÖSSL, ANDREAS, GROLIER, VINCENT
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:On an epitaxy substrate (1), a layer structure (5, 6, 7) provided for light-emitting diodes or other optoelectronic components using thin-film technology is produced and provided with a first connecting layer (2), which comprises one or a plurality of solder materials. A second connecting layer (3) is applied over the whole area on a carrier (10) and permanently connected to the first connecting layer (2) by means of a soldering process.