A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area...

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Hauptverfasser: MEIJERS, RALPH, MULKENS, JOHANNES, RIEPEN, MICHEL, STAVENGA, MARCO, SHULEPOV, SERGEI, BESSEMS, DAVID, WITBERG, ERIK, BELL, FRANCISCUS, KEMPER, NICOLAAS, JOSEN, MARINUS, LEENDERS, MARTINUS, EUMMELEN, ERIK, BRANDS, GERT-JAN, MOERMAN, RICHARD, LIEBREGTS, PAULUS, LI, HUA, EVANGELISTA, PLACE, STEFFENS, KOEN, CRONWIJK, JAN, GUNTHER, PIETER
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.