Retaining ring with convex bottom surface

A retaining ring for a chemical polisher comprises a generally annular body having a top surface (115), an inner diameter surface (235), an outer diameter surface (230) and a bottom surface (155), wherein the bottom surface has a convex shape and wherein a difference in height across the bottom surf...

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Hauptverfasser: CHEN, HUNG CHIH, SCHMIDT, JEFFREY, LIN, JIAN, HUGHES, KERRY F, DELAMENIE, ROMAIN BEAU, HUEY, SIDNEY P, OH, JEONGHOON, ALLEN, ADEN MARTIN, BALAGANI, VENKATA R, MEYER, STACY, DOAN, TRUNG T, ZUNIGA, STEVEN M, WOHLERT, MARTIN S, MCALLISTER, DOUGLAS R, LU, DANIEL CAM TOAN, FONG, MICHAEL JON, GARRETSON, CHARLES C, WANG, JAMES C
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A retaining ring for a chemical polisher comprises a generally annular body having a top surface (115), an inner diameter surface (235), an outer diameter surface (230) and a bottom surface (155), wherein the bottom surface has a convex shape and wherein a difference in height across the bottom surface is between 0.001 mm and 0.05 mm. A method of using a retaining ring comprises lapping a bottom surface of an annular retaining ring to provide a target characteristic, the lapping being performed using a first machine dedicated for use in lapping the bottom surface of retaining rings; securing the retaining ring on a carrier head; and polishing a plurality of device substrates with a second machine using the carrier head, wherein the target surface characteristic substantially matches an equilibrium surface characteristic that would result from breaking-in the retaining ring on the second machine.