OXIDE FILM, COATING SOLUTION FOR FORMING OXIDE FILM, OPTICAL MEMBER USING THE OXIDE FILM, AND METHOD OF PRODUCING THE OPTICAL MEMBER

Provided is an oxide film including an Si component, in which a relative intensity ratio B/A of an absorption peak intensity B at a wavenumber of 1,000 to 850 cm−1 assigned to an Si-O-M bond where M represents H or a metal element to an absorption peak intensity A at a wavenumber of 1,200 to 1,000 c...

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Bibliographische Detailangaben
Hauptverfasser: TANAKA, HIROYUKI, YAMADA, MASAYUKI, HIRAIDE, TETSUYA, KOTANI, YOSHINORI
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Provided is an oxide film including an Si component, in which a relative intensity ratio B/A of an absorption peak intensity B at a wavenumber of 1,000 to 850 cm−1 assigned to an Si-O-M bond where M represents H or a metal element to an absorption peak intensity A at a wavenumber of 1,200 to 1,000 cm−1 assigned to an Si-O bond in infrared absorption spectrum measurement of the film is 0.86 or more to 1.02 or less and an optical member using the oxide film are provided. The oxide film shows suppressed fluctuations in its characteristics even when left to stand under a high-temperature, high-humidity environment for a long time period; has significantly improved durability; and is stable over a long time period and an optical member using the oxide film.